Editing Charge qubit (section)

== Fabrication ==
Charge qubits are fabricated using techniques similar to those used for [[microelectronics]]. The devices are usually made on silicon or sapphire wafers using [[electron beam lithography]] (different from [[phase qubit]], which uses [[photolithography]]) and metallic thin film evaporation processes. To create [[Josephson junction]]s, a technique known as [[Niemeyer–Dolan technique|shadow evaporation]] is normally used; this involves evaporating the source metal alternately at two angles through the lithography defined mask in the electron beam resist. This results in two overlapping layers of the superconducting metal, in between which a thin layer of insulator (normally [[aluminum oxide]]) is deposited.