Open main menu
Home
Random
Recent changes
Special pages
Community portal
Preferences
About Wikipedia
Disclaimers
Incubator escapee wiki
Search
User menu
Talk
Dark mode
Contributions
Create account
Log in
Editing
Gallium nitride
(section)
Warning:
You are not logged in. Your IP address will be publicly visible if you make any edits. If you
log in
or
create an account
, your edits will be attributed to your username, along with other benefits.
Anti-spam check. Do
not
fill this in!
=== Metal-organic vapour phase epitaxy === Blue, white and ultraviolet [[Light-emitting diode|LED]]s are grown on industrial scale by [[Metalorganic vapour-phase epitaxy|metalorganic vapour-phase epitaxy (MOVPE)]].<ref>{{Cite patent|number=US8357945B2|title=Gallium nitride crystal and method of making same|gdate=2013-01-22|invent1=D'Evelyn|invent2=Park|invent3=LeBoeuf|invent4=Rowland|inventor1-first=Mark Philip|inventor2-first=Dong-Sil|inventor3-first=Steven Francis|inventor4-first=Larry Burton|url=https://patents.google.com/patent/US8357945B2/en}}</ref><ref>{{Cite web |title=Google Patents |url=https://patents.google.com/?q=gallium+nitride&assignee=cornell |access-date=2022-10-20 |website=patents.google.com}}</ref> The precursors are [[ammonia]] with either [[trimethylgallium]] or [[triethylgallium]], the carrier gas being [[nitrogen]] or [[hydrogen]]. Growth temperature ranges between {{val|800|and|1100|u=Β°C}}. Introduction of [[trimethylaluminium]] and/or [[trimethylindium]] is necessary for growing quantum wells and other kinds of [[heterostructure]]s.
Edit summary
(Briefly describe your changes)
By publishing changes, you agree to the
Terms of Use
, and you irrevocably agree to release your contribution under the
CC BY-SA 4.0 License
and the
GFDL
. You agree that a hyperlink or URL is sufficient attribution under the Creative Commons license.
Cancel
Editing help
(opens in new window)