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Insulated-gate bipolar transistor
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==Difference between thyristor and IGBT== {| class="wikitable" |+ Difference between thyristor and IGBT<ref>[https://www.nevsemi.com/blog/igbt-vs-thyristor Difference Between IGBT and Thyristor].</ref> |- ! Aspect !! Thyristor !! IGBT |- | Definition || A four-layer semiconductor device with a P-N-P-N structure || An insulated-gate bipolar transistor combining features from bipolar transistors and MOSFETs |- | Terminals || Anode, cathode, gate || Emitter, collector, gate |- | Layers || Four layers || Three layers |- | Junction || PNPN structure || NPN(P) structure |- | Modes of operation || Reverse blocking, forward blocking, forward conducting || On-state, off-state |- | Design structure || Coupled transistors (PNP and NPN) || Combined bipolar and MOSFET features |- | Carrier source || Two sources of carriers || One source of carriers |- | Turn-on voltage || N/A || Low gate voltage required |- | Turn off loss || Higher || Lower |- | Plasma density || Higher || Lower |- | Operating frequency range || Suitable for line frequency, typically lower || Suitable for high frequencies, typically higher |- | Die size and paralleling requirements || Larger die size, can be manufactured as monolithic devices up to 6" (15 cm) in diameter || Smaller die size, often paralleled in a package |- | Power range || Suitable for high-power applications || Suitable for medium-power applications |- | Control requirements || Requires gate current || Requires continuous gate voltage |- | Value for money || Cost-effective || Relatively higher cost |- | Control method || Pulse triggering || Gate voltage control |- | Switching speed || Slower || Faster |- | Current switching capability || High || Moderate |- | Control current || High current drive || Low current drive |- | Voltage capability || High voltage handling || Lower voltage handling |- | Power loss || Higher power dissipation || Lower power dissipation |- | Application || High voltage, robustness || High-speed switching, efficiency |}
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