Editing Nanosensor (section)

==== Lithography ====
It involves starting out with a larger block of some material and carving out the desired form. These carved out devices, notably put to use in specific [[MEMS sensor generations|microelectromechanical systems]] used as microsensors, generally only reach the [[microscopic scale|micro]] size, but the most recent of these have begun to incorporate nanosized components.<ref name="F1" /> One of the most common method is called electron beam lithography. Although very costly, this technique effectively forms a distribution of circular or ellipsoidal plots on the two dimensional surface. Another method is electrodeposition, which requires conductive elements to produce miniaturized devices.<ref name=":6">Pison, U., Giersig, M., & Schaefer, Alex. (2014). US 8846580 B2. Berlin, Germany.</ref>