Editing Electron-beam technology (section)

===Lithography===
{{main|Electron-beam lithography}}
An electron lithograph is produced by a very finely focused electron beam, which creates micro-structures in the resist that can subsequently be transferred to the [[Substrate (materials science)|substrate]] material, often by etching. It was originally developed for manufacturing integrated circuits and is also used for creating [[nanotechnology]] architectures. [[Electron lithography|Electron lithographs]] uses electron beams with diameters ranging from two nanometers up to hundreds of nanometers. The electron lithograph is also used to produce [[Computer-generated holography|computer-generated holograms]] (CGH). Maskless electron lithography has found wide usage in photomask making for [[photolithography]], low-volume production of [[semiconductor]] components, and research and development activities.